Applied Materials Assigned Patent

Applied Materials, Inc., Santa Clara, CA, has been assigned a patent (11,430,801) developed by Koshizawa, Takehito, San Jose, CA, Srinivasan, Mukund, Santa Clara, CA, Kitajima, Tomohiko, Kang, Chang Seok, Kang, Sung-Kwan, Lee, Gill Y., San Jose, CA, and Singha Roy, Susmit, Sunnyvale, CA, for “methods and apparatus for three dimensional NAND structure fabrication.“

The abstract of the patent published by the U.S. Patent and Trademark Office states: “Methods and apparatus for forming a plurality of nonvolatile memory cells are provided herein. In some embodiments, the method, for example, includes forming a plurality of nonvolatile memory cells, comprising forming, on a substrate, a stack of alternating layers of metal including a first layer of metal and a second layer of metal different from the first layer of metal, removing the first layer of metal to form spaces between the alternating layers of the second layer of metal, and one of depositing a first layer of material to partially fill the spaces to leave air gaps therein or depositing a second layer of material to fill the spaces.”

The patent application was filed on April 12, 2021 (17/227,925).